| Title |
A Study of The Photosensitive Characteristic and Fabrication of Polyimide Thin Film by Dry Processing |
| Keywords |
polyimide ; vapor deposition polymerization (VDP) |
| Abstract |
Thin films of polyimide (Pl) were fabricated by a vapor deposition polymerization method (VDPM) and studied for the photosensitive characteristic. Polyamic acid (PAA) thin films fabricated by vapor deposition polymerization (VDP) from 6FDA and 4-4' DDE were converted to PI thin films by thermal curing. From AFM and Ellipsometer experimental, the films thickness was decreased and the reflectance was increased as the curing temperature was increased. Those results implies that thin film is uniform. From UV-Vis spectra, PI thin films showed high absorbance in 225 sim 260 [nm] region. |