| Title |
Microstructure and Properties of SBN Thin film with Deposition Temperature |
| Authors |
김진사(Kim, Jin-Sa) ; 최운식(Choi, Woon-Shik) ; 김충혁(Kim, Chung-Hyeok) |
| Keywords |
Deposition ; Crystallinity ; Rougness ; Capacitance |
| Abstract |
The Sr_{0.7}Bi_{2.3}Nb_{2}O_{9}(SBN) thin films are deposited on Pt-coated electrode(Pt/Ti/SiO_2/Si) using RF sputtering method at various deposition temperature. The optimum conditions of RF power and Ar/O_2 ratio were 60[W] and 70/30, respectively. Deposition rate of SBN thin films was about 4.17[nm/min]. The crystallinity of SBN thin films were increased with increase of deposition temperature in the temperature range of 100~400[°C], the surface rougness showed about 4.33[nm]. The capacitance of SBN thin films were increased with the increase of deposition temperature. |