KIEE - The Transactions of the Korean Institute of Electrical Engineers

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The Transactions of the Korean Institute of Electrical Engineers

The Transactions of the Korean Institute of Electrical Engineers

ISO Journal TitleTrans. Korean. Inst. Elect. Eng.

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Title	Humidity Sensing Characteristics of TiO2 Thin Films Fabricated by R.F.Sputtering Method
Authors	유도현(You, Do-Hyun)
DOI	https://doi.org/10.5370/KIEE.2013.62.7.974
Page	pp.974-979
ISSN	1975-8359
Keywords	TiO_2 thin films ; R.F.sputtering method ; IDE(interdigitated electrode) ; Impedance of thin films ; Substrate temperature
Abstract	TiO_2 thin films are fabricated using R.F.sputtering method. TiO_2 thin films are coated on Al_2O_3 substrate printed IDE(interdigitated electrode). Impedance of thin films decreases according to increase relative humidity and it increases according to decrease measuring frequency. When substrate temperature is room temperature, impedance of thin films is from 45.68[MHz] to 37.76[MHz] within the limits from 30[%RH] to 75[%RH] at 1[kHz]. Whereas when substrate temperature is 100[°C], impedance of thin films is from 692[kHz] to 539[kHz] within the limits from 30[%RH] to 75[%RH] at 1[kHz]. Impedance variation of thin films is bigger in low frequency regions than in high frequency regions. When substrate temperature is 100[°C], impedance of thin films is lower than that of room temperature.

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