| Title |
Electrical Characteristics and Plasma Distribution Depending on Chamber Length in a Top Inductively Coupled Plasma |
| Authors |
홍영훈(Young-Hun Hong) ; 장이랑(Yilang Jiang) ; 김주호(Ju Ho Kim) |
| DOI |
https://doi.org/10.5370/KIEE.2022.71.8.1135 |
| Keywords |
Inductively coupled plasmas; Plasma characteristics; EM field distribution; COMSOL simulation |
| Abstract |
In general, in plasma processing and research, the chamber length setting is a very important because it can change the plasma properties as well as the electromagnetic field (EM) distribution. In this work, the electrical and plasma characteristics are investigated in a top planar inductively coupled plasma with a bottom electrode. The experimental measurements show that the system resistance decreases from 0.145 Ω to 0.138 Ω as the chamber length increases from 6.5 cm to 11 cm. This can be explained by the increasing distance between the antenna and the electrode. When the plasma is discharged and not discharged to compare the distribution of electric and magnetic fields, the simulation is investigated when the chamber length is changed from 4 cm to 11 cm and the plasma density is changed from 1×109 cm-3 to 1×1011 cm-3. Experimental and simulation results are compared with each other and discussed along with the plasma characteristics and electron kinetics. |