| Title |
Characterization of Inductively Coupled Ar/H2 Plasma using Two-dimensional Fluid Simulation Including Heat Transfer Equation |
| DOI |
https://doi.org/10.5370/KIEE.2022.71.2.395 |
| Keywords |
PECVD; Plasma fluid simulation; Inductively coupled plasma; Hydrogen plasma |
| Abstract |
Low temperature Ar/H2 plasma is widely used in various industries, including thin film synthesis and surface cleaning processes. In order to optimize the process conditions, it is important to analyze the characteristics of the Ar/H2 plasma regarding the behavior of electrons and ion species. However, the conventional method lacked information on the gas temperature distribution of neutral species, so it was insufficient to explain the correlation. So, a fluid model of 2D axis-symmetry based on inductively coupled plasma (ICP) source using Ar/H2 gas mixture has been developed. In order to investigate the characteristics of the Ar/H2 plasma in more detail, heat transfer equation was used to explain the effect of the neutral gas temperature. The changes in neutral gas temperature according to the pressure and mixture gas ratio were investigated. And the results of plasma parameters were compared with those obtained when the neutral gas temperature was fixed at 300K and 500K. |