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The Transactions of the Korean Institute of Electrical Engineers

The Transactions of the Korean Institute of Electrical Engineers

ISO Journal TitleTrans. Korean. Inst. Elect. Eng.
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1999-09

P.665

The Effects of the Drive-in Process Parameters on the Residual Stress Profile of the p^+ Silicon Thin Film

정옥찬(Jeong, Ok-Chan) ; 박태규(Park, Tae-Gyu) ; 양상식(Yang, Sang-Sik)
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P.672

Si-to-Si Electrostatic Bonding using LSG Film as an Interlayer

주병권(Ju, Byeong-Gwon) ; 정지원(Jeong, Ji-Won) ; 이덕중(Lee, Deok-Jung) ; 이윤희(Lee, Yun-Hui) ; 최두진(Choe, Du-Jin) ; 오명환(O, Myeong-Hwan)
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P.676

Improvement of Sensitivity in Porous Silicon Alcohol Gas Sensors by UV Light

김성진(Kim, Seong-Jin) ; 최복길(Choe, Bok-Gil)
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